发明名称 |
Lithographic apparatus |
摘要 |
A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus. |
申请公布号 |
US9329494(B2) |
申请公布日期 |
2016.05.03 |
申请号 |
US201414500386 |
申请日期 |
2014.09.29 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
Modderman Theodorus Marinus |
分类号 |
G03B27/42;G03B27/52;G03F7/20 |
主分类号 |
G03B27/42 |
代理机构 |
Pillsbury Winthrop Shaw Pittman LLP |
代理人 |
Pillsbury Winthrop Shaw Pittman LLP |
主权项 |
1. A lithographic apparatus comprising:
a first table configured to support a substrate; a second table, not being configured to support a substrate, comprising a sensor unit configured to sense a property of a patterned beam of radiation from a projection system, the second table configured to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system configured to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, the liquid supply system comprising a liquid confinement structure configured to surround the space to confine the liquid in the space so that a reservoir of the liquid is formed within the liquid confinement structure. |
地址 |
Veldhoven NL |