| 发明名称 | Pattern formation method, mask for exposure, and exposure apparatus | ||
| 摘要 | According to one embodiment, a pattern formation method includes preparing a mask pattern for interference, producing Talbot interference, and forming a pattern by blocking a part of interference light. The mask pattern for interference is arranged periodically a plurality of light transmissive portions. The Talbot interference is based on a transmitted light. The transmitted light is transmitted through the light transmissive portions by applying a light to the mask pattern for interference. The part of interference light is produced by the Talbot interference by means of a mask pattern for light blocking and applying another part of the interference light transmitted through the mask pattern for light blocking to an exposure object member. | ||
| 申请公布号 | US9329490(B2) | 申请公布日期 | 2016.05.03 |
| 申请号 | US201314095533 | 申请日期 | 2013.12.03 |
| 申请人 | KABUSHIKI KAISHA TOSHIBA | 发明人 | Sato Takashi;Inanami Ryoichi;Ito Shinichi;Tanaka Satoshi |
| 分类号 | G03B27/32;G03F7/20 | 主分类号 | G03B27/32 |
| 代理机构 | Finnegan, Henderson, Farabow, Garrett & Dunner, LLP | 代理人 | Finnegan, Henderson, Farabow, Garrett & Dunner, LLP |
| 主权项 | 1. A pattern formation method comprising: preparing a mask pattern for interference, the mask pattern for interference being arranged periodically a plurality of light transmissive portions; producing Talbot interference based on a transmitted light, the transmitted light being transmitted through the light transmissive portions by applying a light to the mask pattern for interference; and forming a pattern by blocking a part of interference light produced by the Talbot interference by means of a mask pattern for light blocking and applying another part of the interference light transmitted through the mask pattern for light blocking to an exposure object member. | ||
| 地址 | Tokyo JP | ||