Photoresist composition and resist pattern-forming method

摘要

A photoresist composition includes a polymer component that includes a first structural unit represented by the formula (1) and a second structural unit represented by the formula (2), an acid generator, and a compound represented by the formula (3). The first structural unit and the second structural unit are included in an identical polymer, or different polymers. R1 is hydrogen atom, fluorine atom, etc., R2 and R3 are independently hydrogen atom, fluorine atom, etc., a is an integer from 1 to 6, R4 and R5 independently hydrogen atom, fluorine atom, etc., R6 is hydrogen atom, fluorine atom, etc., R7 and R8 are each independently alkyl group having 1 to 4 carbon atoms, etc., R9 is alkyl group having 1 to 4 carbon atoms, etc., R10 is hydrogen atom, etc., A− is —N−—SO2—Ra, etc., and X+ is onium cation.;

主权项

1. A photoresist composition comprising:
a polymer component that comprises a first structural unit represented by formula (1) and a second structural unit represented by formula (2), the first structural unit and the second structural unit being included in an identical polymer, or included in different polymers; an acid generator; and a compound represented by formula (3),wherein
R1 is a hydrogen atom, a fluorine atom, a hydroxyl group, or a monovalent organic group having 1 to 20 carbon atoms, R2 and R3 are each independently a hydrogen atom, a fluorine atom, a hydroxyl group, or a monovalent organic group having 1 to 20 carbon atoms, or taken together represent a cyclic structure having 3 to 10 carbon atoms together with the carbon atom bonded to R2 and R3, a is an integer from 1 to 6, provided that a plurality of R2 are either identical or different and a plurality of R3 are either identical or different when a is an integer equal to or larger than 2, R4 and R5 are each independently a hydrogen atom, a fluorine atom, a hydroxyl group, or a monovalent organic group having 1 to 20 carbon atoms, wherein at least one of R4 and R5 is an alicyclic hydrocarbon group having 3 to 20 carbon atoms, an aromatic hydrocarbon group having 6 to 20 carbon atoms, or a heterocyclic group having 3 to 10 nucleus atoms, or R4 and R5 taken together represent a heterocyclic group having 3 to 10 carbon atoms together with the carbon atom bonded to R4 and R5, provided that some or all of hydrogen atoms of the alicyclic hydrocarbon group or the aromatic hydrocarbon group represented by the at least one of R4 and R5 are substituted with a halogen atom, a cyano group, a carboxyl group, a hydroxyl group, a thiol group, or that some or all of hydrogen atoms of the heterocyclic group represented by R4 and R5 are substituted with a substituent or unsubstituted, R6 is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, R7 and R8 are each independently an alkyl group having 1 to 4 carbon atoms or an alicyclic group having 4 to 20 carbon atoms, or taken together represent a divalent alicyclic group together with the carbon atom bonded to R7 and R8, and R9 is an alkyl group having 1 to 4 carbon atoms or an alicyclic group having 4 to 20 carbon atoms, provided that some or all of hydrogen atoms of the alkyl group or the alicyclic group represented by R9 are substituted with a substituent or unsubstituted,wherein
R10 is a hydrogen atom or a monovalent organic group, A− is —N−—SO2—Ra, —COO−, —O−, or —SO3−, provided that a fluorine atom is not bonded to a carbon atom bonded to A−when A−is —SO3−and bonded to a carbon atom, Ra is a linear or branched monovalent hydrocarbon group having 1 to 10 carbon atoms or a cyclic monovalent hydrocarbon group having 3 to 20 carbon atoms, provided that some or all of hydrogen atoms of the hydrocarbon group represented by Ra are substituted with a fluorine atom or unsubstituted, and X+is an onium cation.