发明名称 Semiconductor laser apparatus
摘要 A semiconductor laser apparatus, including: a beam divergence angle correction optical system for correcting a divergence angle of beams generated from light emitting points of a semiconductor laser bar; a beam rotation optical system for rotating the beams each having the corrected divergence angle; a wavelength dispersion optical element having a wavelength dispersion function; and a partial reflection mirror. A relative position of the beam divergence angle correction optical system with respect to the light emitting point in a divergence angle correction direction is changed for each light emitting point.
申请公布号 US9331457(B2) 申请公布日期 2016.05.03
申请号 US201314441091 申请日期 2013.10.01
申请人 Mitsubishi Electric Corporation 发明人 Morita Daiji;Katsura Tomotaka;Konno Susumu;Fujikawa Shuichi;Nishida Satoshi;Kumamoto Kenji;Miyamoto Naoki;Kurokawa Hiroaki
分类号 H01S5/40;H01S5/14;G02B19/00;G02B27/10;G02B27/12;H01S5/022;G02B3/06;G02B27/14;G02B27/42 主分类号 H01S5/40
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A semiconductor laser apparatus for overlapping wavelengths of a plurality of beams emitted from a plurality of light emitting points included in a semiconductor laser bar, the semiconductor laser apparatus comprising: a beam divergence angle correction optical system, which is arranged so that a relative position thereof in a beam divergence angle correction direction, which is a direction orthogonal to a direction in which the plurality of light emitting points are arranged, sequentially changes in order of arrangement of the plurality of light emitting points, the beam divergence angle correction optical system being configured to correct a divergence angle of each of the plurality of beams in the beam divergence angle correction direction; a beam rotation optical system for rotating the each of the plurality of beams having the divergence angle corrected by the beam divergence angle correction optical system with respect to an optical axis thereof; a wavelength dispersion optical element arranged at a focused position at which the plurality of beams transmitted through the beam divergence angle correction optical system and the beam rotation optical system are focused in a plane orthogonal to the beam divergence angle correction direction; and a partial reflection mirror arranged on an optical path of the plurality of beams that are diffracted by the wavelength dispersion optical element and overlapped on the same axis.
地址 Chiyoda-ku JP