发明名称 Silver ink composition and substrate
摘要 There is provided with a silver ink composition which is formed by blending one or more kinds of silver β-ketocarboxylates selected from the group consisting of silver isobutyrylacetate, silver benzoylacetate, silver propionylacetate, silver acetoacetate, silver α-methylacetoacetate, and silver α-ethylacetoacetate, and an aliphatic primary or secondary amine having 1 to 10 carbon atoms, and a substrate with a surface on which a metallic silver layer which is formed by heating the silver ink composition is provided. According to the invention, it is possible to obtain a silver ink composition suitable for forming a metallic silver layer which has superior glossiness and specularity, and a substrate with a surface on which a metallic silver layer is formed using the silver ink composition.
申请公布号 US9328254(B2) 申请公布日期 2016.05.03
申请号 US201113811840 申请日期 2011.07.27
申请人 TOPPAN FORMS CO., LTD. 发明人 Matsumoto Takafumi
分类号 C09D11/52;C09D11/037;C09D11/322 主分类号 C09D11/52
代理机构 Hoffmann & Baron, LLP 代理人 Hoffmann & Baron, LLP
主权项 1. A silver ink composition, which comprises one of (i) to (xiii) selected from the group consisting of (i) a combination of silver α-methylacetoacetate and n-butylamine, (ii) a combination of silver α-methylacetoacetate and n-pentylamine, (iii) a combination of silver α-methylacetoacetate and n-octylamine, (iv) a combination of silver α-methylacetoacetate and N-methylhexylamine, (v) a combination of silver isobutyrylacetate and 2-ethylhexylamine, (vi) a combination of silver benzoylacetate and 2-ethylhexylamine, (vii) a combination of silver acetoacetate and n-propylamine, (viii) a combination of silver acetoacetate and n-butylamine, (ix) a combination of silver acetoacetate and n-pentylamine, (x) a combination of silver acetoacetate and n-hexylamine, (xi) a combination of silver acetoacetate and 2-ethylhexylamine, (xii) a combination of silver acetoacetate and n-octylamine, and (xiii) a combination of silver acetoacetate and N-methylhexylamine,wherein the silver acetate described in (i) to (xiii) is present in 35 mass % to 50 mass % of the total composition and the amine described in (i) to (xiii) is present in 30 mass % to 60 mass % of the total composition.
地址 Tokyo JP