发明名称 |
Semiconductor device and manufacturing method thereof |
摘要 |
A semiconductor device includes first and second Fin FET transistors and a separation plug made of an insulating material and disposed between the first and second Fin FET transistors. The first Fin FET transistor includes a first fin structure extending in a first direction, a first gate dielectric formed over the first fin structure and a first gate electrode formed over the first gate dielectric and extending a second direction perpendicular to the first direction. The second Fin FET transistor includes a second fin structure, a second gate dielectric formed over the second fin structure and a second gate electrode formed over the first gate dielectric and extending the second direction. In a cross section along the second direction and across the first gate electrode, the second gate electrode and the separation plug, the separation plug has a tapered shape having a top size smaller than a bottom size. |
申请公布号 |
US9331074(B1) |
申请公布日期 |
2016.05.03 |
申请号 |
US201514611159 |
申请日期 |
2015.01.30 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
Chang Che-Cheng;Lin Chih-Han |
分类号 |
H01L21/70;H01L27/088;H01L27/092;H01L29/423;H01L29/66;H01L21/8234;H01L21/3105;H01L21/02;H01L21/3213;H01L29/06 |
主分类号 |
H01L21/70 |
代理机构 |
McDermott Will & Emery LLP |
代理人 |
McDermott Will & Emery LLP |
主权项 |
1. A semiconductor device, comprising:
a first Fin FET transistor including a first fin structure extending in a first direction, a first gate dielectric formed over the first fin structure and a first gate electrode formed over the first gate dielectric and extending in a second direction perpendicular to the first direction; a second Fin FET transistor including a second fin structure, a second gate dielectric formed over the second fin structure and a second gate electrode formed over the first gate dielectric and extending in the second direction; and a separation plug made of an insulating material and disposed between the first Fin FET transistor and the second FinFET transistor, wherein in a cross section along the second direction and across the first gate electrode, the second gate electrode and the separation plug, a maximum width of the separation plug is located at a height Hb, which is less than ¾ of a height Ha of the separation plug. |
地址 |
Hsinchu TW |