Lithography system and manufacturing method of commodities

摘要

The present invention provides a lithography system including an obtaining unit which obtains a transfer function describing a relationship between first vibration generated in one lithography apparatus of two lithography apparatuses among at least three lithography apparatuses, and second vibration generated in the other lithography apparatus upon transmission of the first vibration to the other lithography apparatus, and a calculator which calculates, based on the transfer function, an amount of vibration of a first lithography apparatus among the at least three lithography apparatuses due to vibration of lithography apparatuses, other than the first lithography apparatus, and a controller which controls the lithography apparatuses other than the first lithography apparatus, so that the amount of vibration calculated falls below a tolerance.

主权项

1. A lithography system including at least three lithography apparatuses each that form a pattern onto a substrate held by a substrate stage, the system comprising:
a calculation unit that calculates, based on a transfer function, a vibration of a first lithography apparatus, among the at least three lithography apparatuses, due to vibrations of lithography apparatuses other than the first lithography apparatus, among the at least three lithography apparatuses; and a control unit that controls the lithography apparatuses other than the first lithography apparatus, so that the vibration of the first lithography apparatus calculated by the calculation unit falls below a tolerance, wherein the transfer function is a relationship between a first vibration generated in one of two lithography apparatuses, among the at least three lithography apparatuses, and a second vibration generated in the other of the two lithography apparatuses, upon transmission of the first vibration to the other lithography apparatus.