Exposure apparatus and method of manufacturing article

摘要

The present invention provides an exposure apparatus which exposes a substrate, comprising a substrate stage configured to be movable while holding the substrate, a measurement unit configured to measure a height of the substrate by irradiating the substrate with light and detecting the light reflected by the substrate, and a control unit configured to control the measurement unit, wherein the control unit obtains a velocity profile of the substrate stage and decides, based on the velocity profile, a plurality of timings to perform measurement by the measurement unit to equally space a plurality of measurement portions on the substrate measured by the measurement unit in a state in which an acceleration of the substrate stage is nonzero.

主权项

1. An exposure apparatus which exposes a substrate, comprising:
a substrate stage configured to be movable while holding the substrate; a measurement unit configured to measure a height of the substrate by irradiating the substrate with light and detecting the light reflected by the substrate; and a control unit configured to control the measurement unit, wherein the control unit obtains a velocity profile of the substrate stage and decides, based on the velocity profile, a plurality of timings to perform measurement by the measurement unit to equally space a plurality of measurement portions on the substrate measured by the measurement unit in a state in which an acceleration of the substrate stage is nonzero.