| 摘要 |
The present invention is to provide an apparatus for processing a substrate with liquid capable of maintaining a nozzle arm to be clean while restraining pollution inside the apparatus. In the apparatus (16) for processing a substrate with liquid, a treatment liquid nozzle (41) maintained in nozzle arms (42, 43) supplies treatment liquid to a substrate (W) maintained in a substrate maintaining unit (31), and an arm cleaning tub (23) immerses the nozzle arms (42, 43) in cleaning liquid and cleans the whole surface of members of the nozzle arms. |
