| 摘要 |
PURPOSE: To apply a retarding voltage in a low vacuum state where charge of a sample can be neutralized, and in addition, to irradiate the sample with low landing energy charged particles regarding a charged particle beam device for low vacuum using the retarding voltage.CONSTITUTION: A charged particle beam source, an accelerating voltage, an objective lens, a deflection scanning system and a detector which detects secondary charged particles or reflection charged particles which are emitted when plane scan is performed while irradiating a sample with narrowed charged particles, and in which a hole for passing charged particles is provided in the center, are provided at a high vacuum side. A vacuum chamber for neutralizing charge while accommodating and holding the sample in predetermined low vacuum, is provided at a low vacuum side. Between the low vacuum side and the high vacuum side, a first aperture and a second aperture are provided while being coupled. The retarding voltage is applied to the first aperture, the sample is irradiated by charged particle beams while decelerating the charged particle beams, and the charged particle beams are detected by the detector.SELECTED DRAWING: Figure 2 |
