发明名称 |
Thermal Management In Electronic Apparatus With Phase-Change Material And Silicon Heat Sink |
摘要 |
Embodiments of an apparatus with a thermal management technique utilizing a silicon heat sink and/or a phase-change material, as well as an assembling method thereof, are described. In one aspect, the apparatus comprises a main unit, a phase-change material and an enclosure enclosing the main unit and the phase-change material. The main unit comprises a substrate and at least one heat-generating device disposed on the substrate. The phase-change material is in direct contact with each heat-generating device of the at least one heat-generating device to absorb and dissipate heat generated by the at least one heat-generating device. |
申请公布号 |
US2016118699(A1) |
申请公布日期 |
2016.04.28 |
申请号 |
US201614987744 |
申请日期 |
2016.01.04 |
申请人 |
Kim Gerald Ho |
发明人 |
Kim Gerald Ho |
分类号 |
H01M10/6551;H01M10/6569;H01L23/427;H01L23/04;H01L23/367;H01L23/373 |
主分类号 |
H01M10/6551 |
代理机构 |
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代理人 |
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主权项 |
1. An apparatus, comprising:
a main unit, comprising:
a substrate, andat least one heat-generating device disposed on the substrate; a thermal management unit, comprising:
a first silicon heat sink coupled to the at least one heat-generating device and comprising a base portion and a fin portion, the fin portion of the first silicon heat sink comprising a plurality of fins protruding from the base portion,a second silicon heat sink comprising a base portion and a fin portion, the fin portion of the second silicon heat sink comprising a plurality of fins protruding from the base portion, anda phase-change material in direct contact with at least the fin portion of the first silicon heat sink and configured to absorb at least a portion of heat that is generated by the at least one heat-generating device and transferred through the first silicon heat sink; and an enclosure enclosing the main unit and the thermal management unit therein, the second silicon heat sink coupled to the enclosure. |
地址 |
Fallbrook CA US |