发明名称 |
SEMICONDUCTOR CHIP ARRANGEMENT |
摘要 |
A method for processing a semiconductor carrier is provided, the method including: providing a semiconductor carrier including a doped substrate region and a device region disposed over a first side of the doped substrate region, the device region including at least part of one or more electrical devices; and implanting ions into the doped substrate region to form a gettering region in the doped substrate region of the semiconductor carrier. |
申请公布号 |
US2016118466(A1) |
申请公布日期 |
2016.04.28 |
申请号 |
US201614987818 |
申请日期 |
2016.01.05 |
申请人 |
Infineon Technologies AG |
发明人 |
Laven Johannes;Schulze Hans-Joachim |
分类号 |
H01L29/32;H01L23/532;H01L23/528;H01L29/36;H01L23/26 |
主分类号 |
H01L29/32 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor chip arrangement comprising:
a semiconductor wafer substrate including a doped substrate region and a device region disposed over a first side of the doped substrate region; one or more electrical devices formed at least partially in the device region of the semiconductor carrier; a gettering region comprising hydrogen-decorated intrinsic point defect complexes formed in the doped substrate region of the semiconductor carrier; and a metal layer disposed over a second side of the doped substrate region. |
地址 |
Neubiberg DE |