发明名称 SEMICONDUCTOR CHIP ARRANGEMENT
摘要 A method for processing a semiconductor carrier is provided, the method including: providing a semiconductor carrier including a doped substrate region and a device region disposed over a first side of the doped substrate region, the device region including at least part of one or more electrical devices; and implanting ions into the doped substrate region to form a gettering region in the doped substrate region of the semiconductor carrier.
申请公布号 US2016118466(A1) 申请公布日期 2016.04.28
申请号 US201614987818 申请日期 2016.01.05
申请人 Infineon Technologies AG 发明人 Laven Johannes;Schulze Hans-Joachim
分类号 H01L29/32;H01L23/532;H01L23/528;H01L29/36;H01L23/26 主分类号 H01L29/32
代理机构 代理人
主权项 1. A semiconductor chip arrangement comprising: a semiconductor wafer substrate including a doped substrate region and a device region disposed over a first side of the doped substrate region; one or more electrical devices formed at least partially in the device region of the semiconductor carrier; a gettering region comprising hydrogen-decorated intrinsic point defect complexes formed in the doped substrate region of the semiconductor carrier; and a metal layer disposed over a second side of the doped substrate region.
地址 Neubiberg DE