| 摘要 |
PROBLEM TO BE SOLVED: To improve a pulse modulation system for switching the high frequency power, used in plasma processing, between high level and low level alternately.SOLUTION: In this plasma processing apparatus, if the weighted average weighting variables K is set 0.5<K<1, when applying high/low pulse modulation to high frequency for plasma generation, for example, reflection wave are generated at a constant power PReven during a pulse on period Ton the high frequency feed line of a plasma generation system, but the power PRof the reflection wave in a pulse off period Tis reduced. By adjusting the value of k, balance of the reflection wave power in the pulse on period Tand the reflection wave power in the pulse off period Tcan be controlled arbitrarily.SELECTED DRAWING: Figure 1 |
