发明名称 CYLINDRICAL MASK PRODUCTION METHOD, EXPOSURE METHOD AND PATTERN FORMATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a cylindrical mask production method capable of preventing complication of a structure.SOLUTION: A cylindrical mask is produced, in which the cylindrical mask serves as a part of a spherical face of a predetermined curvature radius whose center point is on a predetermined axial line, and a pattern is formed on an outer peripheral face which is a partial spherical face formed around the axial line in a belt-state. A pattern which is an original plate is disposed on an object face side of a projection optical system having a negative petzval sum whose magnitude corresponds to the curvature radius, is disposed, the pattern serving as the original plate is moved in one-dimension along the object face, and the outer peripheral face serving as the partial spherical face of the cylinder becoming the cylindrical mask is disposed on an image face side of the projection optical system, and then the cylinder is rotated around the axial line with speed corresponding to speed of movement of the pattern in one-dimension, for transferring the pattern to the outer peripheral face serving as the partial spherical face of the cylinder.SELECTED DRAWING: Figure 2
申请公布号 JP2016066105(A) 申请公布日期 2016.04.28
申请号 JP20160017951 申请日期 2016.02.02
申请人 NIKON CORP 发明人 KUMAZAWA MASAHITO
分类号 G03F7/20;G03F1/00;G03F1/24;G03F1/70 主分类号 G03F7/20
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