发明名称 METHODS FOR MODEL-BASED PROCESS SIMULATION
摘要 PROBLEM TO BE SOLVED: To provide lithography simulation using a differential model.SOLUTION: The differential model describes differences in imaging characteristics of two scanners related to tunable and non-tunable settings. A model for one of the two scanners is derived by using the model of the other scanner and the differential model. Similarly, a sensitivity model describes the differences in the imaging characteristics of one scanner related to different scanner settings. Additionally, the differential model and the sensitivity model are calibrated by comparison with printing results.SELECTED DRAWING: Figure 8
申请公布号 JP2016066091(A) 申请公布日期 2016.04.28
申请号 JP20150238241 申请日期 2015.12.07
申请人 ASML NETHERLANDS BV 发明人 YE JUN;CAO YU;RONALDUS GOOSSENS;SHAO WENJIN;JIM KOONMEN
分类号 G03F7/20;G03F1/36 主分类号 G03F7/20
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