METROLOGY TARGET DESIGN METHOD, APPARATUS, AND MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide a method for efficient optimization for a lithography metrology target.SOLUTION: Stack and profile information 102, target design degrees of freedom 104, and nominal process variation data 106 are provided to an optical simulator 108 using an apparatus parameter 109, modeling being performed using inputs to generate one or more optical characteristics. Part of the information relating to the metrology target design is modified and the signal modeling and metrology algorithm are repeated by an optimization loop 104 to optimize the accuracy and precision of one or more measurements. The metrology target design is displayed or stored after the accuracy and precision are optimized.SELECTED DRAWING: Figure 2