SUBSTRATE PROCESSING METHOD, PROGRAM, COMPUTER STORAGE MEDIUM, AND SUBSTRATE PROCESSING SYSTEM

摘要

PROBLEM TO BE SOLVED: To appropriately form a prescribed pattern on a substrate in substrate processing which uses a block copolymer containing a hydrophilic polymer and a hydrophobic polymer.SOLUTION: A method for processing a wafer using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer comprises the steps of: forming a prescribed resist pattern on the wafer (step S3); forming a thin film for suppressing deformation of the resist pattern on a surface of the resist pattern (step S4); applying the block copolymer to the wafer after forming the thin film (step S5); and phase-separating the block copolymer into the hydrophilic polymer and the hydrophobic polymer.SELECTED DRAWING: Figure 6