| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition that is useful for forming a black matrix layer and that exhibits high resistance in a photosensitive resin layer formed therefrom and excellent lithography characteristics in patterning.SOLUTION: The photosensitive resin composition comprises a resin (A) having a cardo skeleton, a photopolymerization initiator (B), a silane coupling agent (C), and a colorant (D). The colorant (D) comprises carbon black coated with an epoxy resin.SELECTED DRAWING: None |
