| 摘要 |
PROBLEM TO BE SOLVED: To provide a nozzle anode unit which can easily control an anode position during electrodeposition, and which is used for a plating apparatus comprising an anode displacement mechanism.SOLUTION: A NAU 10 comprises: plating liquid injection parts 11a-11d; and an insoluble anode 12 whose relative position with respect to the plating liquid injection parts 11a-11d is managed. The NAU 10 further comprises, insoluble anode curve parts 12A-12C and insoluble anode projection part 12D along a plated surface of a plated member 2. A NAU 20 comprises: plating liquid injection parts 21d-21e; and an insoluble anode 22 whose relative position with respect to the plating liquid injection parts 21d-21e is managed, and further comprises insoluble anode projection parts 22D-22E and insoluble anode curve parts 22F-22H along the plated surface of the plated member 2.SELECTED DRAWING: Figure 1 |
