POLISHING MATERIAL, POLISHING COMPOSITION, AND POLISHING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a polishing material, a polishing composition and a polishing method which can remove waviness on an outer surface of a resin coating film by polishing and are less likely to cause polishing flaws.SOLUTION: A polishing composition contains a polishing material formed of particles of aluminum oxide having a specific surface area of 5 m/g or more and 50 m/g or less and an average secondary particle diameter of 0.05 μm or more and 4.8 μm or less. The polishing composition is used for polishing an outer surface of a resin coating film.SELECTED DRAWING: None