ETCHING LIQUID FOR SEMICONDUCTOR SUBSTRATE

摘要

The present invention pertains to an alkaline etching fluid for treating the surface of a semiconductor substrate for a solar cell, wherein the etching fluid contains at least one hydroxystyrene polymer shown by general formula (1), and an alkali agent. The present invention demonstrates the effect of exceptional productivity and the capability to form a texture on the semiconductor substrate for a solar cell at comparatively low temperatures and in a shorter amount of time.