发明名称 |
PHOTOPATTERNABLE COMPOSITIONS AND METHODS OF FABRICATING TRANSISTOR DEVICES USING SAME |
摘要 |
The present teachings relate to compositions for forming a negative-tone photopatternable dielectric material, where the compositions include, among other components, an organic filler and one or more photoactive compounds, and where the presence of the organic filler enables the effective removal of such photoactive compounds (after curing, and during or after the development step) which, if allowed to remain in the photopatterned dielectric material, would lead to deleterious effects on its dielectric properties. |
申请公布号 |
WO2016065276(A1) |
申请公布日期 |
2016.04.28 |
申请号 |
WO2015US57143 |
申请日期 |
2015.10.23 |
申请人 |
POLYERA CORPORATION |
发明人 |
ZHENG, YAN;HU, YAN;ZHAO, WEI;FACCHETTI, ANTONIO |
分类号 |
G03F7/025;G03F7/027;G03F7/038;G03F7/075;G03F7/40;H01L27/00;H01L29/00 |
主分类号 |
G03F7/025 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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