REFLECTIVE MASKS FOR USE IN EXTREME ULTRAVIOLET LITHOGRAPHY APPARATUS AND METHODS OF MANUFACTURING THE SAME

摘要

Reflective masks, and methods of manufacturing the same, include a reflective multi-layer on a mask substrate, a plurality of support patterns spaced apart from one another in the main trench. The plurality of support patterns are in a main trench of the reflective multi-layer. The plurality of support patterns correspond to areas of the reflective mask not transferred onto an exposure target substrate. The support patterns partition the main trench to form a plurality of auxiliary trenches. The reflective mask further includes a light absorption pattern including a plurality of auxiliary light absorption patterns in the auxiliary trenches.

主权项

1. A reflective mask, comprising:
a reflective multi-layer on a mask substrate; a plurality of support patterns spaced apart from one another,
the support patterns being in a main trench of the reflective multi-layer,the support patterns corresponding to areas of the reflective mask not transferred onto an exposure target substrate, andthe support patterns partitioning the main trench to form a plurality of auxiliary trenches; and a light absorption pattern including a plurality of auxiliary light absorption patterns, the auxiliary light absorption patterns being in the auxiliary trenches.