| 摘要 |
The present invention relates to a substrate supporting apparatus for fixing and supporting a substrate so as to process the substrate with liquid, and to a substrate liquid processing apparatus equipped with the same. The apparatus comprises: a rotational table for supporting and rotating the substrate; a fixing table fixated and installed on the top of a central unit of the rotational table; and a spray unit for spraying processing liquid on the processed surface of the substrate. According to the present invention, the apparatus provides effects in reducing rotational driving force and precisely controlling the rotational speed of the substrate, by separating the table for fixing and supporting the substrate into a rotational table and a fixing table, supporting the substrate, and reducing the size of the rotational portion of the table. |
