SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PROGRAM, AND RECORDING MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing device capable of suppressing a gas dispersion plate that a shower head has from getting clogged, a method of manufacturing a semiconductor substrate, a program, and a recording medium.SOLUTION: A substrate processing device 100 comprises: a processing chamber 201 which processes a substrate 200; a shower head 230 provided upstream from the processing chamber 201; a gas supply pipe 242 connected to the shower head 230; a first exhaust pipe 262 connected to a downstream side of the processing chamber 201; a second exhaust pipe 263 connected to a second wall surface other than the first wall surface different from a first wall surface adjoining the processing chamber 201 among wall surfaces constituting the shower head 230; a pressure detection part 280 provided to the second exhaust pipe 263; and a control part 360 controlling respective constructions.SELECTED DRAWING: Figure 1