| 发明名称 |
(METH)ACRYLATE-BASED RESIN COMPOSITION HAVING EXCELLENT IMPACT RESISTANCE AND TRANSPARENCY |
| 摘要 |
Disclosed is a (meth)acrylate-based resin composition comprising a poly(alkyl(meth)acrylate-phenyl(meth)acrylate) copolymer comprising phenyl(meth)acrylate having excellent surface hardness and a high refractive index, as a base resin and a (conjugated diene (meth)acrylate) graft copolymer having excellent impact absorption efficiency, the (meth)acrylate-based resin composition providing excellent transparency by exhibiting excellent impact resistance even using a small amount of impact modifier. The (meth)acrylate-based resin composition having excellent impact resistance and transparency comprises 1 to 29 wt % of the (conjugated diene-(meth)acrylate) graft copolymer and 71 to 99 wt % of the poly(alkyl(meth)acrylate-phenyl(meth)acrylate) copolymer. |
| 申请公布号 |
US2016115309(A1) |
申请公布日期 |
2016.04.28 |
| 申请号 |
US201414893030 |
申请日期 |
2014.06.25 |
| 申请人 |
LG CHEM, LTD. |
发明人 |
KANG Byoung IL;HAN Chang Hun;SEO Jae Bum;SUNG Da Eun;LEE Dae Woo;CHOI Eun Jung |
| 分类号 |
C08L33/08;C08L53/02;C08L51/04 |
主分类号 |
C08L33/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A (meth)acrylate-based resin composition comprising 71 to 99 wt % of a poly(alkyl(meth)acrylate-phenyl(meth)acrylate) copolymer and 1 to 29 wt % of a conjugated diene based polymer. |
| 地址 |
Seoul KR |
