METHOD OF FORMING DIAMOND CONDITIONERS FOR CMP PROCESS

摘要

A method for making a conditioner disk used in a chemical mechanical polishing (CMP) process comprises applying a first layer of at least one binder over a substrate; disposing a plurality of diamond particles on the first layer of the at least one first binder at the plurality of locations; and fixing the plurality of diamond particles to the substrate by heating the substrate to a raised temperature and then cooling the substrate. The plurality of diamond particles disposed over the substrate are configured to provide a working diamond ratio higher than 50% when the conditioner disk is used in a CMP process.

主权项

1. A conditioner disk used in a chemical mechanical process (CMP), comprising:
a substrate; a first binder layer comprising at least one first binder disposed over the substrate; a plurality of diamond particles disposed on the first binder layer at a plurality of locations; and a second layer of at least one second binder over the substrate, wherein at least one top portion of each of the plurality of diamond particles protrudes out of the second layer of at least one second binder and is exposed, and the plurality of diamond particles disposed over the substrate are configured to provide a working diamond ratio higher than 50% when the conditioner disk contacts a flat surface.