BOARD PROCESSING METHOD, COMPUTER STORAGE MEDIUM, AND BOARD PROCESSING SYSTEM

摘要

A board processing method for processing a board on which a resist film has been formed comprises: an exposure step in which an electron beam is used to perform a pattern exposure of the resist film on the board; a post-exposure step in which a UV light is used to perform a post-exposure of the resist film on the board after performance of the pattern exposure; a PEB processing step in which a PEB processing is performed for the board after the post-exposure; and a development processing step in which the resist film as subjected to the PEB processing is developed, thereby forming a resist pattern on the board. If a cycle time from the end of the exposure step to the start of the PEB processing step deviates from a predetermined time, the exposure amount in the post-exposure step is corrected in accordance with the deviation of the cycle time.