发明名称 SPUTTERING TARGET AND SPUTTERING TARGET SET
摘要 PROBLEM TO BE SOLVED: To provide a cylindrical sputtering target that is hardly breakable in use and facilitated in cooling a target material from the inside thereof, and to provide a sputtering target set.SOLUTION: A sputtering target 1 includes: a target material 2 providing a cylindrical shape and comprising a ceramic sintered body; and a backing tube 3 for holding the target material 2. The target material 2 has a through-hole 2a bored in an axial direction of the cylindrical shape. The backing tube 3 is inserted into the through-hole 2a. A formation material of the backing tube 3 has a melting point higher than that of the ceramic sintered body. The target material 2 and the backing tube 3 are directly connected to each other.SELECTED DRAWING: Figure 1
申请公布号 JP2016065311(A) 申请公布日期 2016.04.28
申请号 JP20150184402 申请日期 2015.09.17
申请人 SUMITOMO CHEMICAL CO LTD 发明人 NAKADA KUNIHIKO
分类号 C23C14/34;C04B35/00;C04B35/453;C04B35/457;C04B37/02 主分类号 C23C14/34
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