| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a porous polymer film utilizing ion beam irradiation and the subsequent chemical etching, by which the degree of freedom in the control of the shape of pores to be formed, typically, the cross-sectional shape thereof is high.SOLUTION: There is provided a method for producing a porous polymer film containing: a step (I) where a polymer film is irradiated with ion beams; and a step (II) where at least a part of the part against which the ions in the polymer film after the beam irradiation is collided is subjected to chemical etching to form a through hole and/or a non-through hole elongating along the locus of the collision of the ions on the film. In the step (II), the chemical etching is performed where, by the arrangement of a masking layer to either the main face of the polymer film, compared with the etching of the above part from either the main face, the degree of the etching of the above part from the other main face is high.SELECTED DRAWING: Figure 5 |
