PHASE SHIFT BLANKMASK AND PHOTOMASK USING THE FLAT PANEL DISPLAY

摘要

The present invention relates to a phase inversion blank mask for a flat panel display (FPD) and a photomask. According to the present invention, the phase inversion blank mask for the FPD comprises: a transparent substrate; a phase inversion membrane provided on the transparent substrate; a metal membrane provided on the phase inversion membrane and used as an etching mask of the phase inversion membrane; and a resist membrane provided on an upper part of the metal membrane. By forming, on the phase inversion membrane, the metal membrane used as the etching mask of the phase inversion membrane, adhesiveness to the resist membrane increases, and cross-sectional conformation of a pattern is improved. Thus, it is possible to provide the phase inversion blank mask for the FPD on which a high-quality and high-precision phase inversion membrane pattern with reduced loading effects is created by thin-processing the resist membrane, and it is also possible to provide the photomask using the same.