| 摘要 |
The plasma reactor for cleaning silicon tetrachloride or germanium tetrachloride contaminated with hydrogen containing compounds, comprises reactor housing, high voltage supply, micro unit for plasma treatment, grounded metallic heat exchanger (4.2), dielectric (4.4), perforated plate, grid or network (4.1) and a high voltage electrode (4.3). The longitudinal axis of the dielectric, the metallic heat exchangers and the high voltage electrode are oriented parallel to one another and oriented parallel to the vector direction of the gravity force. Independent claims are included for: (1) System for production of highly pure silicon tetrachloride or highly pure germanium tetrachloride; and (2) procedure for production of highly pure silicon tetrachloride or highly pure germanium tetrachloride. |
