发明名称 保持パッド
摘要 PROBLEM TO BE SOLVED: To provide a holding pad into which a liquid component of a polishing liquid is restrained from intruding and service life of which can be improved while ensuring a retention property of an object to be polished.SOLUTION: A holding pad 10 includes a urethane sheet 2 which is formed by a wet film forming method and has holding surface P. The urethane sheet 2 has a skin layer 2a on a side of the holding surface P and cells 5 formed in an inner side than the skin layer 2a. The cells 5 are communicated with the holding surface P while interposing the skin layer 2a therebetween. Polyalkylene oxides and acylated celluloses are contained in a resin portion of the urethane sheet 2. The polyalkylene oxides contain bonded ethylene oxides of ≤50% mass ratio and has a number-average molecular weight of ≥10,000. A content of the polyalkylene oxides is adjusted to 1-8 mass% with respect to the resin component and a content of the acylated celluloses is adjusted to 40-100 mass% with respect to the polyalkylene oxides. As a result, a hydrophobicity of the holding pad can be enhanced as a whole.
申请公布号 JP5912770(B2) 申请公布日期 2016.04.27
申请号 JP20120079900 申请日期 2012.03.30
申请人 富士紡ホールディングス株式会社 发明人 代田 悟郎;吉田 泰司
分类号 B24B37/30;C08J9/28;H01L21/304 主分类号 B24B37/30
代理机构 代理人
主权项
地址