OCULAR METROLOGY EMPLOYING SPECTRAL WAVEFRONT ANALYSIS OF REFLECTED LIGHT

摘要

Interferometry-based methods and apparatus are presented for analysing one or more wavefronts from a sample, in which the sample wavefronts are interfered with two or more reference wavefronts to produce two or more interferograms in a sufficiently short time period for the interferograms to be captured in a single exposure of an image capture device such as a CCD array. Each interferogram has a unique carrier frequency dependent on the angle between a respective pair of sample and reference wavefronts. In certain embodiments multiple sample and/or reference wavefronts are generated using scanning mirrors, while in other embodiments utilising multi-wavelength beams multiple sample and/or reference wavefronts are generated with wavelength dispersive elements. The methods and apparatus are suitable for measuring aberrations at one or more positions on the retina of an eye.