| 摘要 |
The present invention relates to a photosensitive material and a method for forming a pattern. The method includes the step of providing a composition containing a component made of a photosensitive material which is operable to float to a top region of a layer formed from the photosensitive material. For example, a photosensitive layer refers to a first component having a fluorine atom (e.g., an alkyl fluoride group). After forming the photosensitive layer, the first component floats to a top surface of the photosensitive layer, and the photosensitive layer is patterned thereafter. |
