发明名称 基板処理装置及び基板処理方法
摘要 A substrate processing apparatus including a transfer unit for transferring, under reduced pressure, a laminate including a wafer and a support plate which are bonded to each other and supported by use of support pins that supports an inner periphery of a first surface of the wafer, the first surface being opposite to a second surface of the wafer onto which a second surface the support plate is bonded.
申请公布号 JP5913914(B2) 申请公布日期 2016.04.27
申请号 JP20110244832 申请日期 2011.11.08
申请人 東京応化工業株式会社 发明人 稲尾 吉浩
分类号 H01L21/677;B65G49/07;H01L21/02 主分类号 H01L21/677
代理机构 代理人
主权项
地址