| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a reflective mask blank which has a light-shielding frame with a high light blocking effect, and can form a transfer pattern with high accuracy, a method for manufacturing the same, and a reflective mask. <P>SOLUTION: Particle adhesion to a circuit pattern area 85 is suppressed, and deterioration of mask defect quality is suppressed since a light-shielding frame 25 is formed at a pre-stage of forming the circuit pattern area 85, and a multilayer reflection layer 21 is not removed for forming the light-shielding frame 25. In addition, there is no fear that several layers of the multilayer reflection layer 21 remain, intensity of reflected light to be generated from the multilayer reflection layer 21 is suppressed, and the light-shielding frame 25 with a high light blocking effect is formed since the multilayer reflection layer 21 is not removed for forming the light-shielding frame 25. Thus, a transfer pattern is formed with high accuracy by using reflective masks 101, 201, 301, 401. <P>COPYRIGHT: (C)2013,JPO&INPIT |
