| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition which can achieve high resolution and high sensitivity at the i-line as well as excellent resistance to a strong alkaline aqueous solution.SOLUTION: A positive photosensitive resin composition contains an alkali-soluble resin (A), a photosensitive agent (B), and a thermal base generator (C). The alkali-soluble resin (A) is preferably a polyamide resin, and more preferably a polyamide resin with a structure represented by the general formula (1). (In the formula, X and Y are each an organic group. Rrepresents a hydroxyl group, a carboxyl group, -O-Ror -COO-R. When there are more than one, they can be identical or different. Rrepresents a hydrogen atom or a C1-C15 organic group. In addition, l is an integer from 0 to 8, and a represents the polymerization degree and is an integer from 2 to 500.) |
