| 摘要 |
A substrate stage device (20A) is provided with: a first step guide (50) which extends in a scan direction (the X axis direction) and which can move in a cross scan direction (the Y axis direction); a fine movement stage (30) which is supported from below by the first step guide (50), can move along the top surface of the first step guide (50) in the scan direction, and can move together with the first step guide (50) in the cross scan direction; and a position measurement system which defines the top surface of a second step guide (54) as the reference surface and uses a Z sensor (38z) provided on the fine movement stage (30) to calculate Z tilt position information of the fine movement stage (30). |
