发明名称 レジスト膜の形成方法、および、静電噴霧装置
摘要 <P>PROBLEM TO BE SOLVED: To provide a formation method of a resist film, capable of uniformly forming the resist film at a low cost. <P>SOLUTION: The formation method of the resist film, for forming the resist film on a workpiece 3 by electrostatic spraying, includes: a step of applying a prescribed voltage between a nozzle 2 and the workpiece 3 and spraying resist liquid from the nozzle 2 to the workpiece 3; and a step of curing the resist liquid sprayed onto the workpiece 3 and forming the resist film. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP5912321(B2) 申请公布日期 2016.04.27
申请号 JP20110162001 申请日期 2011.07.25
申请人 アピックヤマダ株式会社 发明人 小林 一彦
分类号 B05D1/04;B05B5/053;B05B5/10;H01L21/027 主分类号 B05D1/04
代理机构 代理人
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