发明名称 |
Soft switching semiconductor device and method for producing thereof |
摘要 |
A semiconductor device has a semiconductor body with a first side and a second side that is arranged distant from the first side in a first vertical direction. The semiconductor device has a rectifying junction, a field stop zone of a first conduction type, and a drift zone of a first conduction type arranged between the rectifying junction and the field stop zone. The semiconductor body has a net doping concentration along a line parallel to the first vertical direction. At least one of (a) and (b) applies:
(a) the drift zone has, at a first depth, a charge centroid, wherein a distance between the rectifying junction and the charge centroid is less than 37% of the thickness the drift zone has in the first vertical direction;(b) the absolute value of the net doping concentration comprises, along the straight line and inside the drift zone, a local maximum value. |
申请公布号 |
US9324783(B2) |
申请公布日期 |
2016.04.26 |
申请号 |
US201414501298 |
申请日期 |
2014.09.30 |
申请人 |
Infineon Technologies AG |
发明人 |
Falck Elmar;Schmidt Gerhard |
分类号 |
H01L29/739;H01L29/06;H01L21/761;H01L21/765 |
主分类号 |
H01L29/739 |
代理机构 |
Murphy, Bilak & Homiller, PLLC |
代理人 |
Murphy, Bilak & Homiller, PLLC |
主权项 |
1. A semiconductor device comprising:
a semiconductor body having a first side and a second side opposite the first side, the second side being arranged distant from the first side in a first vertical direction; a rectifying junction; a field stop zone of a first conduction type arranged in the semiconductor body; and a drift zone of the first conduction type arranged in the semiconductor body between the rectifying junction and the field stop zone; wherein the semiconductor body has, along a straight line running parallel to the first vertical direction, a net doping concentration; and wherein at least one of (a) and (b) applies: (a) the drift zone comprises, at a first depth, a doping charge centroid, wherein a distance between the rectifying junction and the doping charge centroid is less than 37% of a thickness of the drift zone in the first vertical direction; (b) the absolute value of the net doping concentration comprises, along the straight line and inside the drift zone, a local maximum value. |
地址 |
Neubiberg DE |