发明名称 Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
摘要 A liquid immersion member forms a liquid immersion space on an object movable below an optical member so that the light path of exposure light emitted from an emission surface of an optical member is filled with liquid. The liquid immersion member includes a first member disposed in at least a portion of the periphery of the optical member, and a second member which is movable at the outside of at least a portion of the first member and which includes a recovery port that recovers at least a portion of the liquid in the liquid immersion space.
申请公布号 US9323160(B2) 申请公布日期 2016.04.26
申请号 US201313793667 申请日期 2013.03.11
申请人 NIKON CORPORATION 发明人 Shibazaki Yuichi
分类号 G03B27/52;G03B27/42;G03F7/20 主分类号 G03B27/52
代理机构 Oliff PLC 代理人 Oliff PLC
主权项 1. A liquid immersion member in which a liquid immersion space is formed on an object movable below an optical member so that a light path of exposure light emitted from an emission surface of the optical member is filled with liquid, the liquid immersion member comprising: a first member which is disposed in at least a portion of a periphery of the optical member; a second member which is movable relative to the first member and which includes a recovery port that recovers at least a portion of the liquid in the liquid immersion space; and a suppression portion that suppresses infiltration of the liquid into a gap between the first member and the second member.
地址 Tokyo JP