发明名称 |
Pattern formation method, stamper manufacturing method, and magnetic recording medium manufacturing method |
摘要 |
According to one embodiment, a pattern formation method includes steps of forming a layer to be processed on a substrate, forming a metal microparticle layer by coating the layer to be processed with a metal microparticle coating solution containing metal microparticles and a solvent, reducing a protective group amount around the metal microparticles by first etching, forming a protective layer by exposing the substrate to a gas containing C and F and adsorbing the gas around the metal microparticles to obtain a projection pattern, and transferring the projection pattern to the layer to be processed by second etching. |
申请公布号 |
US9324355(B2) |
申请公布日期 |
2016.04.26 |
申请号 |
US201414206271 |
申请日期 |
2014.03.12 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
Takizawa Kazutaka;Iwasaki Takeshi;Takeo Akihiko |
分类号 |
B44C1/22;C03C15/00;C03C25/68;C23F1/00;G11B5/84;C25D1/10;H01L21/3065;H01L21/263;H01L21/311;G03F1/00;G03F7/00;G11B5/855 |
主分类号 |
B44C1/22 |
代理机构 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A pattern formation method, comprising:
forming a layer to be processed on a substrate; forming a metal microparticle layer by coating the layer to be processed with a metal microparticle coating solution comprising metal microparticles and a solvent; reducing a protective group amount around the metal microparticles by first etching; after the reducing the protective group, exposing the substrate and the metal microparticles to a gas comprising carbon and fluorine to form a protective layer, to adsorb the gas around the metal microparticles to substitute the gas for the protective group, and to obtain a projection pattern; and transferring the projection pattern to the layer to be processed by second etching. |
地址 |
Minato-ku JP |