Compound semiconductor device and manufacturing method of the same

摘要

An embodiment of a compound semiconductor device includes: a substrate; a nitride compound semiconductor stacked structure formed on or above the substrate; and a gate electrode, a source electrode and a drain electrode formed on or above the compound semiconductor stacked structure. A recess positioning between the gate electrode and the drain electrode in a plan view is formed at a surface of the compound semiconductor stacked structure.

主权项

1. A compound semiconductor device, comprising:
a substrate; a nitride compound semiconductor stacked structure formed on or above the substrate; and a gate electrode, a source electrode and a drain electrode formed on or above the compound semiconductor stacked structure, wherein the compound semiconductor stacked structure comprises:
a nitride electron transit layer;a nitride electron supply layer formed on or above the nitride electron transit layer; anda nitride surface layer formed on or above the nitride electron supply layer, the nitride surface layer comprises:
a GaN lower layer;an AlGaN intermediate layer formed on the GaN lower layer; anda GaN upper layer formed on the AlGaN intermediate layer, anda recess comprising a plurality of depths formed at the nitride surface layer between the drain electrode and an end portion of the gate electrode on the drain electrode side in a plan view,wherein a first one of the plurality of depths is not less than a total thickness of the GaN upper layer and the AlGaN intermediate layer and not more than a total thickness of the GaN upper layer, the AlGaN intermediate layer and the GaN lower layer,wherein the first one of the plurality of depths extends through the GaN upper layer, through the AlGaN intermediate layer, and partially through the GaN lower layer.