Semiconductor integrated circuit device and a method of manufacturing the same

摘要

A semiconductor device including a memory cell featuring a first gate insulating film over a semiconductor substrate, a control gate electrode over the first gate insulating film, a second gate insulating film over the substrate and a side wall of the control gate electrode, a memory gate electrode over the second gate insulating film arranged adjacent with the control gate electrode through the second gate insulating film, first and second semiconductor regions in the substrate positioned on a control gate electrode side and a memory gate side, respectively, the second gate insulating film featuring a first film over the substrate, a charge storage film over the first film and a third film over the second film, the first film having a first portion between the substrate and memory gate electrode and a thickness greater than that of a second portion between the control gate electrode and the memory gate electrode.

主权项

1. A method of forming a semiconductor device, comprising:
forming a semiconductor substrate, forming a first gate electrode and a second gate electrode spaced along a first direction in a first main surface of the semiconductor substrate, forming a first gate insulation film formed between the first gate electrode and the semiconductor substrate, forming a second gate insulation film formed between the second gate electrode and the semiconductor substrate, forming a first insulation film formed over the first gate electrode, forming a second insulation film formed over the second gate electrode, forming a third gate electrode arranged opposite to the second gate electrode across the first gate electrode, and adjacent to the first gate electrode, forming a fourth gate electrode arranged opposite to the first gate electrode across the second gate electrode, and adjacent to the second gate electrode, forming a third gate insulation film formed between the third gate electrode and the semiconductor substrate, and between the first gate electrode and the third gate electrode, and including a first charge storage part in an inside portion of the third gate insulation film, and forming a fourth gate insulation film formed between the fourth gate electrode and the semiconductor substrate, and between the second gate electrode and the fourth gate electrode, and including a second charge storage part in an inside portion of the fourth gate insulation film, wherein the first gate electrode, the first gate insulation film, the first insulation film, the third gate electrode, and the third gate insulation film form a first memory cell, wherein the second gate electrode, the second gate insulation film, the second insulation film, the fourth gate electrode, and the fourth gate insulation film form a second memory cell, wherein in the first main surface, a length of the first insulation film in the first direction is shorter than a length of the first gate electrode, and wherein in the first main surface, a length of the second insulation film in the first direction is shorter than a length of the second gate electrode.