发明名称 Semiconductor device and method for driving the same
摘要 A semiconductor device includes a semiconductor layer stack 13 formed on a substrate 11 and having a channel region, a first electrode 16A and a second electrode 16B formed spaced apart from each other on the semiconductor layer stack 13, a first gate electrode 18A formed between the first electrode 16A and the second electrode 16B, and a second gate electrode 18B formed between the first gate electrode 18A and the second electrode 16B. A first control layer 19A having a p-type conductivity is formed between the semiconductor layer stack 13 and the first gate electrode 18A.
申请公布号 USRE45989(E1) 申请公布日期 2016.04.26
申请号 US201414301066 申请日期 2014.06.10
申请人 PANASONIC CORPORATION 发明人 Morita Tatsuo;Yanagihara Manabu;Ishida Hidetoshi;Uemoto Yasuhiro;Ueno Hiroaki;Tanaka Tsuyoshi;Ueda Daisuke
分类号 H03K17/687;H01L29/778;H01L27/06 主分类号 H03K17/687
代理机构 McDermott Will & Emery LLP 代理人 McDermott Will & Emery LLP
主权项 1. A semiconductor device, comprising: a semiconductor layer stack of a nitride semiconductor or a silicon carbide semiconductor formed on a substrate and having a channel region; a first electrode and a second electrode formed spaced apart from each other on the semiconductor layer stack; and a first gate electrode formed between the first electrode and the second electrode, and a second gate electrode formed between the first gate electrode and the second electrode, wherein: a potential greater than a threshold voltage of the first gate electrode with reference to a potential of the first electrode is applied to the first gate electrode and a potential less than or equal to a threshold voltage of the second gate electrode with reference to a potential of the second electrode is applied to the second gate electrode, whereby the semiconductor device is brought to a reverse-blocking state in which a current flows from the second electrode to the first electrode but not from the first electrode to the second electrode; and a potential less than or equal to the threshold voltage of the first gate electrode with reference to the potential of the first electrode is applied to the first gate electrode and a potential less than or equal to the threshold voltage of the second gate electrode with reference to the potential of the second electrode is applied to the second gate electrode, whereby the semiconductor device is brought to a non-conductive state in which a current does not flow in either direction between the first electrode and the second electrode.
地址 Osaka JP