发明名称 Display panel and manufacturing method, panel display device thereof
摘要 The present invention provides a display panel, which includes active area and vacant area surrounding the active area, and dummy pattern area without display functionality being disposed along boundary between active area and vacant area. The present invention also provides a manufacturing method of display panel and a panel display device. The present invention disposes dummy pattern area along boundary active area to withstand loading effect and to ensure active area is not affected by loading effect and display patterns are normal and uniform.
申请公布号 US9323080(B2) 申请公布日期 2016.04.26
申请号 US201213643089 申请日期 2012.09.13
申请人 Shenzhen China Star Optoelectronics Technology Co., Ltd 发明人 Zheng Hua;Chen Shyh-Feng;Lin Pei;Lin Mingwen;Wu Liangdong;Gao Pan;Chen Shangpan;Pan Long
分类号 C09K19/00;G02F1/1333 主分类号 C09K19/00
代理机构 代理人 Cheng Andrew C.
主权项 1. A display panel, comprising an active area and a vacant area surrounding the active area, and a dummy pattern area without display functionality being along boundary between the active area and the vacant area; the active area, the vacant area and the dummy pattern area are disposed on pattern layers of the display panel for lithography or etching in a wet process, and the pattern layers comprise: a pixel electrode layer, a first metal layer and a second metal layer; the active area and the dummy pattern area are disposed on the pixel electrode layer and the dummy pattern area comprises a plurality of dummy pixels; the active area comprises a plurality of pixels having normal pattern design, and pattern design of the dummy pixels is identical to the normal pattern design of the pixels, and pattern of the dummy pixels near the vacant area is an irregular pattern; wherein the irregular pattern is generated from solution concentrations being existing at an intersection area of the dummy pattern area and the active area, at the active area, and at the dummy pattern area, and the solution concentration at the dummy patter area gradually decreases from the intersection area towards the vacant area during the wet process.
地址 Shenzhen, Guangdong CN
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