发明名称 Light emitting diode and method of fabricating the same
摘要 Disclosed herein is a light emitting diode, the structure of the light emitting diode comprises a substrate, a first-type semiconductor layer, a structural layer, a light emitting layer, a second-type semiconductor layer, a transparent conductive layer, a first contact pad and a second contact pad in regular turn. The structural layer comprises a stacked structure having a trapezoid sidewall and nano columns extending from the trapezoid sidewall in regular arrangement. Also, a method for fabricating the light emitting diode is disclosed.
申请公布号 US9324909(B2) 申请公布日期 2016.04.26
申请号 US201514739779 申请日期 2015.06.15
申请人 LEXTAR ELECTRONICS CORPORATION 发明人 Yu Chang-Chin;Tang Hsiu-Mu;Lin Mong-Ea
分类号 H01L21/00;H01L33/20;H01L33/32;H01L33/00;H01L33/42;H01L33/06;H01L33/08;H01L33/12 主分类号 H01L21/00
代理机构 Moser Taboada 代理人 Moser Taboada
主权项 1. A method for fabricating a light emitting diode, comprising the steps of: providing a substrate comprising a first area and a second area; forming, by an epitaxial growth process, a cushion layer, a first-type semiconductor layer, a light emitting layer and a second-type semiconductor layer sequentially on the substrate; defining, by a photolithography and an etching processes, the first-type semiconductor layer, the light emitting layer and the second-type semiconductor layer for exposing the first-type semiconductor layer in the first area, and forming a platform having the first-type semiconductor layer, the light emitting layer and the second-type semiconductor layer in a position other than the first area; forming a plurality of nano-scale masks spaced regularly on the platform; forming a cross-sectional trapezoid hard mask on the platform to cover the nano-scale masks where a light emitting diode stacked structure to be formed; removing, by an anisotropic etching process, the platform without covered by the cross-sectional trapezoid hard mask and the nano-scale masks, and forming the light emitting diode stacked structure having a trapezoid sidewall and nano columns, wherein the trapezoid sidewall has an inclined surface, a portion of the nano columns extends from the inclined surface in regular arrangement, and the first-type semiconductor layer is as an etching endpoint; removing the cross-sectional trapezoid hard mask and the nano-scale masks; forming a transparent conductive layer on the second-type semiconductor layer of the light emitting diode stacked structure having a trapezoid sidewall; forming a first contact pad on the first portion of the first-type semiconductor layer in the first area; and forming a second contact pad on the transparent conductive layer.
地址 Hsinchu TW