发明名称 |
Light emitting diode and method of fabricating the same |
摘要 |
Disclosed herein is a light emitting diode, the structure of the light emitting diode comprises a substrate, a first-type semiconductor layer, a structural layer, a light emitting layer, a second-type semiconductor layer, a transparent conductive layer, a first contact pad and a second contact pad in regular turn. The structural layer comprises a stacked structure having a trapezoid sidewall and nano columns extending from the trapezoid sidewall in regular arrangement. Also, a method for fabricating the light emitting diode is disclosed. |
申请公布号 |
US9324909(B2) |
申请公布日期 |
2016.04.26 |
申请号 |
US201514739779 |
申请日期 |
2015.06.15 |
申请人 |
LEXTAR ELECTRONICS CORPORATION |
发明人 |
Yu Chang-Chin;Tang Hsiu-Mu;Lin Mong-Ea |
分类号 |
H01L21/00;H01L33/20;H01L33/32;H01L33/00;H01L33/42;H01L33/06;H01L33/08;H01L33/12 |
主分类号 |
H01L21/00 |
代理机构 |
Moser Taboada |
代理人 |
Moser Taboada |
主权项 |
1. A method for fabricating a light emitting diode, comprising the steps of:
providing a substrate comprising a first area and a second area; forming, by an epitaxial growth process, a cushion layer, a first-type semiconductor layer, a light emitting layer and a second-type semiconductor layer sequentially on the substrate; defining, by a photolithography and an etching processes, the first-type semiconductor layer, the light emitting layer and the second-type semiconductor layer for exposing the first-type semiconductor layer in the first area, and forming a platform having the first-type semiconductor layer, the light emitting layer and the second-type semiconductor layer in a position other than the first area; forming a plurality of nano-scale masks spaced regularly on the platform; forming a cross-sectional trapezoid hard mask on the platform to cover the nano-scale masks where a light emitting diode stacked structure to be formed; removing, by an anisotropic etching process, the platform without covered by the cross-sectional trapezoid hard mask and the nano-scale masks, and forming the light emitting diode stacked structure having a trapezoid sidewall and nano columns, wherein the trapezoid sidewall has an inclined surface, a portion of the nano columns extends from the inclined surface in regular arrangement, and the first-type semiconductor layer is as an etching endpoint; removing the cross-sectional trapezoid hard mask and the nano-scale masks; forming a transparent conductive layer on the second-type semiconductor layer of the light emitting diode stacked structure having a trapezoid sidewall; forming a first contact pad on the first portion of the first-type semiconductor layer in the first area; and forming a second contact pad on the transparent conductive layer. |
地址 |
Hsinchu TW |