发明名称 不揮発性メモリ装置及びその動作方法
摘要 An array of non-volatile memory cells in a semiconductor substrate of a first conductivity type. Each memory cell comprises first and second regions of a second conductivity type on a surface of the substrate, with a channel region therebetween. A word line overlies one portion of the channel region, is adjacent to the first region, and has little or no overlap with the first region. A floating gate overlies another portion of the channel region, and is adjacent to the first portion and the second region. A coupling gate overlies the floating gate. An erase gate overlies the second region. A bit line is connected to the first region. A negative charge pump circuit generates a negative voltage. A control circuit generates a plurality of control signals in response to receiving a command signal, and applies the negative voltage to the word line of unselected memory cells.
申请公布号 JP5908645(B2) 申请公布日期 2016.04.26
申请号 JP20150500426 申请日期 2013.02.07
申请人 シリコン ストーリッジ テクノロージー インコーポレイテッドSILICON STORAGE TECHNOLOGY, INC. 发明人 トラン ヒュー ヴァン;グエン フン クオック;ドー ニャン
分类号 H01L27/10;G11C16/02;G11C16/04;G11C16/06;H01L21/336;H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L27/10
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