发明名称 PHOTOELECTRIC CONVERSION ELEMENT AND METHOD OF MANUFACTURING PHOTOELECTRIC CONVERSION ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a photoelectric conversion element excellent in characteristics even if the width of a gap region is larger than the width of an overlapping region.SOLUTION: A photoelectric conversion element includes a semiconductor substrate (1) of first conductivity type or second conductivity type, a first conductivity type amorphous semiconductor film (3) and a second conductivity type amorphous semiconductor film (5) provided on one side of the semiconductor substrate (1). A first electrode (11) is provided on the first conductivity type amorphous semiconductor film (3), and a second electrode (12) is provided on the second conductivity type amorphous semiconductor film (5). An overlapping region (21), i.e., a region where the end of the first conductivity type amorphous semiconductor film (3) and the end of the second conductivity type amorphous semiconductor film (5) are overlapping, is provided. The width Wg of a gap region (22) between adjoining first electrode (11) and second electrode (12) is wider than the width Wo of the overlapping region (21). The width Wg of the gap region (22) is 120 μm or less, and the area rate of the gap region (22) is 16% or less.SELECTED DRAWING: Figure 1
申请公布号 JP2016063071(A) 申请公布日期 2016.04.25
申请号 JP20140189945 申请日期 2014.09.18
申请人 SHARP CORP 发明人 ASANO NAOKI;HIEDA TAKESHI;OKAMOTO CHIKAO;HIGASHI KENICHI
分类号 H01L31/0747 主分类号 H01L31/0747
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